Activiteiten / TNO lunch lecture

October 8th 13:00-15:00
G0.10 Science Park

As EUV lithography scanners evolve, so do the physical challenges — with rising source power and increasing demands on performance. At TNO, we explore how EUV light and plasma interact with materials and gases, helping to extend scanner lifetime and reliability. This work calls for deep expertise in materials science, plasma physics, and advanced metrology. With a range of experimental setups — culminating in our next-generation EUV exposure tool, EBL2 — we’re uncovering the physics that drives innovation in nanolithography.